APMP key comparison for the 10 MΩ and 1 GΩ resistance

Author

Kwang Min Yu ; Wan Seop Kim ; Kwon Soo Han ; Hsu, Jimmy Chun-Ming ; Jessadajin, Chiwat ; Ishak, Nirul Irwani ; Zhou Yinzhu ; Kaneko, Nobu-hisa ; Pritchard, Brian ; Matlejoane, Alexander ; Liang Bo ; Semenov, Yuri P. ; Lam, Brenda H. S. ; Termikhanov, Dana

Author_Institution

Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea

fYear

2014

fDate

24-29 Aug. 2014

Firstpage

300

Lastpage

301

Abstract

A key comparison for the 10 MΩ and 1 GΩ resistance, APMP.EM-K2, has been carried out by the Asia-Pacific Metrology Program(APMP) Regional Metrology Organization(RMO). The purpose is to establish the degree of equivalence of resistance among the national metrology institutes(NMIs) within APMP, in support of CIPM Mutual Recognition Agreement(MRA). The key comparison artifacts are three 10 MΩ and three 1 GΩ resistance standards which was loaned from NIST and the 13 NMIs were participated in the comparison. The results will be presented at the conference.

Keywords

electric resistance measurement; APMP.EM-K2; Asia-Pacific Metrology Program; CIPM Mutual Recognition Agreement; MRA; NIST; NMI; National Metrology Institute; RMO; Regional Metrology Organization; resistance 1 Gohm; resistance 10 Mohm; resistance standard; Atmospheric measurements; Electrical resistance measurement; Metrology; Particle measurements; Resistance; Schedules; Standards; High resistance measurement techniques; High resistance standards; Key Comparison; measurement uncertainty;

fLanguage

English

Publisher

ieee

Conference_Titel

Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on

Conference_Location

Rio de Janeiro

ISSN

0589-1485

Print_ISBN

978-1-4799-5205-2

Type

conf

DOI

10.1109/CPEM.2014.6898378

Filename

6898378