Layer Curing for Masked Projection Stereolithography: the effects of varying irradiance distributions

Recent stereolithography rapid prototyping advancements have been in the area of microstereolithography. Microstereolithography incorporates an integral curing approach to the creation of layers. Integral curing has been made possible by the advent of dynamic masking generators such as LCD and DMD devices. Much of the theory for this new layering process has only been applied on a micro-scale and awaits further development for application on medium to large sized parts. This paper presents some recent research on the topic of the integral curing process and analyses a mathematical model used for process planning of integral curing using a microstereolithography apparatus. Aspects of the mathematical model are enhanced to prepare the way for its application to medium and large sized parts, and two methods for achieving even irradiance for each model layer are proposed.