An intelligent power device using poly-Si sandwiched wafer bonding technique

A new simple isolation structure has been realized by using poly-Si sandwiched wafer bonding technique. We confirmed that the poly-Si layer enabled the bonded interface to be void-free and electrically perfect, and had the effect that it enabled the reverse recovery time of the parasitic diode of Vertical DMOSFET (VDMOS) to be short. In the new structure, the isolation capabilities were adequate to integrate 60 V VDMOS and control circuits on the same chip. Especially, the parasitic bipolar action has been suppressed. We evaluated an intelligent power device which uses this technique and have confirmed the availability of the new isolation structure