• DocumentCode
    2368619
  • Title

    Importance of Data Quality in Virtual Metrology

  • Author

    Huang, Yi-Ting ; Cheng, Fan-tien ; Chen, Yeh-Tung

  • Author_Institution
    Inst. of Manuf. Eng., Nat. Cheng Kung Univ., Tainan
  • fYear
    2006
  • fDate
    6-10 Nov. 2006
  • Firstpage
    3727
  • Lastpage
    3732
  • Abstract
    The purpose of VM is to enable the manufacturers to conjecture the wafer quality and deduce the causes of defects without performing physical metrology. VM requires a large amount of sensor data retrieved from production tools. However, inappropriateness and instability of the data collection system, which leads to incorrectness, fragment and asynchrony of data collected, may lead to inaccurate conjecture results. Hence, not only precision of the VM conjecture module but also quality of the collected data are essential to ensure accurate and stable VM results for improving production yield. In this work, the importance of data quality to VM is investigated. The data quality mechanism is proposed for data characteristic analysis, data anomaly detection, data cleaning, data normalization, and data reduction. Besides, the equipment of semiconductor chemical vapor deposition (CVD) is adopted as a practical example to illustrate the significance of data quality mechanism, and further verify feasibility and effectiveness of VM
  • Keywords
    chemical vapour deposition; production engineering computing; semiconductor device manufacture; data anomaly detection; data characteristic analysis; data cleaning; data collection system instability; data normalization; data quality mechanism; data reduction; production tools; semiconductor chemical vapor deposition; virtual metrology; wafer quality; Costs; Data engineering; Information retrieval; Job shop scheduling; Manufacturing processes; Metrology; Monitoring; Production equipment; Semiconductor device manufacture; Virtual manufacturing; Virtual metrology; data quality;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE Industrial Electronics, IECON 2006 - 32nd Annual Conference on
  • Conference_Location
    Paris
  • ISSN
    1553-572X
  • Print_ISBN
    1-4244-0390-1
  • Type

    conf

  • DOI
    10.1109/IECON.2006.347318
  • Filename
    4153229