DocumentCode
2369028
Title
Ion beam irradiation of high-temperature superconductors: From nano-size defects to the fabrication of nanodevices
Author
Lang, W. ; Richter, H. ; Marksteiner, M. ; Siraj, K. ; Bodea, M.A. ; Pedarnig, J.D. ; Bäuerle, D. ; Hasenfuss, C. ; Palmetshofer, L. ; Kolarova, R. ; Bauer, P.
Author_Institution
Fac. of Phys., Vienna Univ., Vienna
fYear
2008
fDate
24-27 March 2008
Firstpage
886
Lastpage
890
Abstract
Ion-beam irradiation of high-temperature superconductors creates different types of defects depending on ion mass, energy and dose. Computer simulations reveal the diversity of the ion-target interactions with YBa2Cu3O7 and are compared to previous experimental results from transmission electron microscopy and electrical transport properties. While protons have a very low efficiency to create defects in YBa2Cu3O7, significantly heavier ions produce defect clusters and inhomogeneous damage in the target material. On the other hand, He+ ions with energy of about 75 keV do not implant into 100-nm thick films of YBa2Cu3O7 but primarily create point defects by displacement of the oxygen atoms. Such defects are very small and distributed homogeneously in YBa2Cu3O7. The small lateral straggle of the collision cascades allow for the patterning of nanostructures by directing a low divergence beam of He+ ions onto a thin film of YBa2Cu3O7 through a mask. Features with about 60 nm size have been produced and observed by transmission electron microscopy.
Keywords
barium compounds; copper compounds; high-temperature superconductors; ion beam effects; nanopatterning; superconducting thin films; transmission electron microscopy; yttrium compounds; YBa2Cu3O7; defect clusters; electrical transport properties; high-temperature superconductors:; inhomogeneous damage; ion beam irradiation; ion-target interactions; nano-size defects; nanodevices fabrication; nanostructures patterning; oxygen displacement; transmission electron microscopy; Computer simulation; Fabrication; Helium; High temperature superconductors; Implants; Ion beams; Nanostructures; Protons; Thick films; Transmission electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location
Shanghai
Print_ISBN
978-1-4244-1572-4
Electronic_ISBN
978-1-4244-1573-1
Type
conf
DOI
10.1109/INEC.2008.4585625
Filename
4585625
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