DocumentCode :
23695
Title :
Quaternary Barrier InAlGaN HEMTs With f_{T}/f_{\\max } of 230/300 GHz
Author :
Ronghua Wang ; Guowang Li ; Karbasian, G. ; Jia Guo ; Bo Song ; Yuanzheng Yue ; Zongyang Hu ; Laboutin, O. ; Yu Cao ; Johnson, Wayne ; Snider, G. ; Fay, Patrick ; Jena, D. ; Xing, Huili Grace
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
Volume :
34
Issue :
3
fYear :
2013
fDate :
Mar-13
Firstpage :
378
Lastpage :
380
Abstract :
Depletion-mode quaternary barrier In0.13Al0.83 Ga0.04N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductance of 770 mS/mm, and cutoff frequencies fT/fmax of 230/300 GHz at the same bias, which give a record-high value of √fT ·fmax = 263 GHz among all reported InAl(Ga)N barrier HEMTs. The device speed shows good scalability with gate length despite the onset of short-channel effects due to the lack of a back barrier. An effective electron velocity of 1.36 ×107 cm/s, which is comparable with that in the state-of-the-art deeply scaled AlN/GaN HEMTs, has been extracted from the gate-length dependence of fT for gate lengths from 100 to 40 nm.
Keywords :
high electron mobility transistors; ohmic contacts; HEMT; InAlGaN; T gates; back barrier; cutoff frequencies; depletion mode quaternary barrier; electron velocity; extrinsic dc transconductance; high electron mobility transistors; maximum output current density; ohmic contacts; short channel effect; size 40 nm; substrate; Delay; Gallium nitride; HEMTs; Logic gates; MODFETs; Ohmic contacts; Cutoff frequency; HFET; T-gate; electron velocity; high-electron-mobility transistor (HEMT); mobility; quaternary; regrown ohmic contact;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2238503
Filename :
6417951
Link To Document :
بازگشت