• DocumentCode
    2371372
  • Title

    High-performance monolithically-integrated E/D mode InAlN/AlN/GaN HEMTs for mixed-signal applications

  • Author

    Tang, Yong ; Saunier, Paul ; Wang, Ronghua ; Ketterson, Andrew ; Gao, Xiang ; Guo, Shiping ; Snider, Gregory ; Jena, Debdeep ; Xing, Huili ; Fay, Patrick

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    Monolithically-integrated E- and D-mode InAlN/AlN/GaN HEMTs for mixed-signal applications have been demonstrated. For devices with gate lengths of 144 nm, peak tranconductances of 0.92 S/mm and 0.84 S/mm have been obtained for E- and D-mode devices, respectively, while maximum drain currents of 1.84 A/mm and 1.9 A/mm have been measured for E- and D-mode devices. RF performance is also well-matched, with E-mode devices exhibiting ft´s of 94 GHz and fmax´s of 176 GHz, while D-mode devices had ft´s of 94 GHz and fmax´s of 174 GHz. Ring oscillators have been fabricated to demonstrate the technology.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; HEMT; InAlN-AlN-GaN; frequency 174 GHz; frequency 176 GHz; frequency 94 GHz; mixed-signal application; monolithically-integrated E/D mode; peak tranconductance; ring oscillator; size 144 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703451
  • Filename
    5703451