Investigation of thin-film nanocomposite materials by monochromatic null ellipsometry

Author

Lebedev, Mikhail S. ; Ayupov, Boris M.

Author_Institution

Nikolaev Inst. of Inorg. Chem. SB RAS, Novosibirsk

fYear

2008

fDate

1-5 July 2008

Firstpage

30

Lastpage

33

Abstract

Possibility of a method ellipsometry application for investigation of the multi-layer films and structures was shown. Reliability of obtaining data was confirmed with independent method of X-rays photoelectron spectroscopy. Layerwise composition of HfO₂/SiO₂/Si stack was studied. It was shown that interfacial layer of hafnium silicate was formed between HfO₂ film and Si substrate. Investigation of the HfO₂/Si, ZrO₂/Si, Ta₂O₅/Si, Al₂O₃/Si structures after annealing in oxygen ambient disclosed that the oxides under study were permeable for diffusion of oxygen. As a result the thickness of SiO₂ layer was increased during annealing process. It was revealed, that Al₂O₃-films were oxygen-tight. The developed ellipsometric method was used for optimization of the (HfO₂)_x(Al₂O₃)_1-x layers obtaining.

Keywords

X-ray photoelectron spectra; annealing; dielectric thin films; diffusion; ellipsometry; hafnium compounds; multilayers; nanocomposites; permeability; silicon; tantalum compounds; zirconium compounds; Al₂O₃-Si; HfO₂-SiO₂-Si; Si; Ta₂O₅-Si; X-ray photoelectron spectroscopy; ZrO₂-Si; annealing; dielectric films; hafnium silicate; interfacial layer; monochromatic null ellipsometry; multilayer films; oxygen diffusion; permeability; reliability; thin-film nanocomposite; Annealing; Ellipsometry; Hafnium oxide; Nanostructured materials; Optimization methods; Semiconductor films; Spectroscopy; Substrates; Transistors; X-rays; Ellipsometry; high-k dielectric films; layer;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices and Materials, 2008. EDM 2008. 9th International Workshop and Tutorials on

Conference_Location

Novosibirsk

ISSN

1815-3712

Print_ISBN

978-5-7782-0893-3

Type

conf

DOI

10.1109/SIBEDM.2008.4585838

Filename

4585838