DocumentCode
2373445
Title
RF B-field effects in inductive plasma sources
Author
Cohen, R.H. ; Rognlien, T.D.
Author_Institution
Lawrence Livermore Nat. Lab., CA, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
248
Abstract
Summary form only given. For inductive plasma sources, the RF electric field E/sub rf/ decays going into the plasma owing to the skin effect and finite geometry. This short scale length gives rise to a strong RF magnetic field B/sub rf//spl prop/1/f, where f is the RF frequency. The resulting qv/spl times/B/sub rf/ force for electrons typically exceeds the qE/sub rf/ force for f/spl les/14 MHz. In the linear regime (/spl nu//sub rf//spl Lt//spl nu//sub thermal/), the magnitude of the collisionless (or stochastic) heating for an isotropic distribution is not changed by B/sub rf/, but it does cause the energy to be deposited primarily in the velocity component along E/sub rf//spl times/B/sub rf/ rather than along E/sub rf/. In the nonlinear regime, B/sub rf/ can stop most of the electrons before they reach the wall sheath, with an effect that is qualitatively like a ponderomotive potential. Here the collisionless heating level is reduced below that predicted from linear theory. Analytical results are given for the for the nonlinear regime when the transit time is either small or large compared to the wave period, and linear regime with arbitrary transit time, and compared to numerical results. Numerical results with a self-consistent DC potential show improved plasma uniformity, as expected from the ponderomotive-like effect. Collisions in the field region can modify these results; this is explored numerically by adding a model for pitch-angle scattering.
Keywords
high-frequency discharges; plasma collision processes; plasma heating; plasma production; sputter etching; 14 MHz; RF B-field effects; RF electric field; collisionless heating level; finite geometry; inductive plasma sources; linear regime; nonlinear regime; pitch-angle scattering; ponderomotive-like effect; self-consistent DC potential; short scale length; skin effect; Electrons; Geometry; Heating; Magnetic fields; Plasma sources; Plasma waves; Radio frequency; Scattering; Skin effect; Stochastic processes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.533246
Filename
533246
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