• DocumentCode
    2380494
  • Title

    Diagnostics of plasma process induced failure on analog device´s mismatch characteristics

  • Author

    Shih, J.R. ; Huang, Anney ; Chinn, Y.H. ; Chin, C.C. ; Peng, Yeng ; Yue, J.T.

  • Author_Institution
    Taiwan Semiconductor Manufacturing Cowpany
  • fYear
    2002
  • fDate
    5-7 June 2002
  • Firstpage
    64
  • Lastpage
    67
  • Keywords
    Analog circuits; Antenna measurements; Leakage current; MOSFET circuits; Plasma applications; Plasma devices; Plasma diagnostics; Plasma measurements; Plasma properties; Protection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma- and Process-Induced Damage, 2002 7th International Symposium on
  • Conference_Location
    Maui, HI, USA
  • Print_ISBN
    0-9651577-7-6
  • Type

    conf

  • DOI
    10.1109/PPID.2002.1042610
  • Filename
    1042610
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2380494