DocumentCode
23810
Title
Glow Characterization of Octafluorocyclobutane RF Plasmas
Author
Chun Huang ; Yan-Ren Wang ; Wei-Chun Ma ; Ching-Yuan Tsai
Author_Institution
Dept. of Chem. Eng. & Mater. Sci., Yuan Ze Univ., Chungli, Taiwan
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2566
Lastpage
2567
Abstract
The glow characteristics and optical emission features of octafluorocyclobutane radio frequency plasmas with various gas flow rates were investigated. The plasma glow was characterized by optical photography and optical emission spectroscopy. The glow differences were attributed to the nature of the luminous gas phase with respect to polymer-forming species and etching species.
Keywords
glow discharges; high-frequency discharges; plasma diagnostics; plasma materials processing; polymers; sputter etching; etching species; gas flow rates; luminous gas phase; octafluorocyclobutane RF plasmas; optical emission spectroscopy; optical photography; plasma glow characterization; polymer-forming species; radiofrequency plasmas; Biomedical optical imaging; Color; Optical polymers; Plasmas; Radio frequency; Stimulated emission; Plasma applications; plasma devices; plasma devices.;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2323405
Filename
6822631
Link To Document