• DocumentCode
    2387367
  • Title

    MUGFET - alternative transistor architecture for 32 nm CMOS generation

  • Author

    Jurczak, M. ; Collaert, N. ; Rooyackers, R. ; Kottantharayil, A. ; Dixit, A. ; Ferain, I. ; San, T. ; Son, N.-J. ; Lenoble, D. ; Zimmerman, P. ; De Keersgieter, A. ; Von Arnim, K. ; Ramos, J. ; Mercha, A. ; Verheyen, P.

  • Author_Institution
    IMEC, Leuven
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In this paper, the suitability of the MUGFET technology as an alternative device architecture for 32 nm CMOS generation is discussed. In particular, the requirements for the MUGFET devices with focus on FIN geometry, gate stack, and junctions are analyzed. Technological challenges related to the processing of MUGFET devices such as, FIN and gate patterning, junctions and spacer formation, are also presented
  • Keywords
    CMOS integrated circuits; MOSFET; nanopatterning; silicon-on-insulator; 32 nm; 32 nm CMOS technology; FIN geometry; MUGFET technology; device architecture; double gate devices; gate patterning; gate stack; junctions depth; short channel effect; spacer formation; CMOS technology; Capacitance; Fluctuations; Geometry; Microelectronics; Space technology; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology, 2006. IWJT '06. International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0047-3
  • Type

    conf

  • DOI
    10.1109/IWJT.2006.220846
  • Filename
    1669433