Title :
Full wafer integration of NEMS on CMOS by nanostencil lithography
Author :
Arcamone, Julien ; Van den Boogaart, Marc A F ; Serra-Graells, F. ; Hansen, Sven ; Brugger, Jurgen ; Torres, Francesc ; Abadal, Gabriel ; Barniol, Nuria ; Perez-Murano, F.
Author_Institution :
Spain Microsyst. Lab., Ecole Polytechnique Federale de Lausanne
Abstract :
Wafer scale nanostencil lithography is used to define 200 nm scale mechanically resonating silicon cantilevers monolithically integrated into CMOS circuits. We demonstrate the simultaneous patterning of ~2000 nano-devices by post-processing standard CMOS wafers using one single metal evaporation, pattern transfer to silicon and subsequent etch of the sacrificial layer. Resonance frequencies around 1.5 MHz were measured in air and vacuum and tuned by applying dc voltages of 10V and 1V respectively
Keywords :
CMOS integrated circuits; cantilevers; micromechanical devices; nanolithography; 1 V; 10 V; 200 nm; CMOS technology; NEMS; metal evaporation; nanostencil lithography; pattern transfer; silicon cantilevers; Lithography; Nanoelectromechanical systems;
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
Electronic_ISBN :
1-4244-0439-8
DOI :
10.1109/IEDM.2006.346830
