• DocumentCode
    2391349
  • Title

    Thermal Select MRAM with a 2-bit Cell Capability for beyond 65 nm Technology Node

  • Author

    Leuschner, R. ; Klostermann, U.K. ; Park, H. ; Dahmani, F. ; Dittrich, R. ; Grigis, C. ; Hernan, K. ; Mege, S. ; Park, C. ; Clech, M.C. ; Lee, G.Y. ; Bournat, S. ; Altimime, L. ; Mueller, G.

  • Author_Institution
    MRAM Joint Dev. Project, Qimonda AG, Corbeil-Essonnes
  • fYear
    2006
  • fDate
    11-13 Dec. 2006
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We report on a novel thermal select (TS) MRAM with multilevel programming capability. Exchange bias pinning of a magnetic free layer (FL) was used to achieve a thermally stable bit and to reduce writing currents. This report shows experimental data for a TS-based magnetic tunnel junction (MTJ) with a size of 50 times90 nm2, the smallest size reported so far. Multilevel capability with 2 bits per 1-transistor and 1-MTJ (1T1MTJ) is also demonstrated on a 70 times 140 nm2 MTJ. With the advanced 2-bit cell concept, a 70% increase in effective bit density can be achieved at 65 nm technology node
  • Keywords
    magnetic storage; magnetic tunnelling; random-access storage; 2 bit; 65 nm; magnetic free layer; magnetic tunnel junction; multilevel programming; thermal select MRAM; transistor; writing currents; Heating; Magnetic tunneling; Manufacturing; Nonvolatile memory; Pulse circuits; Pulse measurements; Random access memory; Switches; Temperature; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2006. IEDM '06. International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    1-4244-0439-8
  • Electronic_ISBN
    1-4244-0439-8
  • Type

    conf

  • DOI
    10.1109/IEDM.2006.346986
  • Filename
    4154421