Title :
Thermal Select MRAM with a 2-bit Cell Capability for beyond 65 nm Technology Node
Author :
Leuschner, R. ; Klostermann, U.K. ; Park, H. ; Dahmani, F. ; Dittrich, R. ; Grigis, C. ; Hernan, K. ; Mege, S. ; Park, C. ; Clech, M.C. ; Lee, G.Y. ; Bournat, S. ; Altimime, L. ; Mueller, G.
Author_Institution :
MRAM Joint Dev. Project, Qimonda AG, Corbeil-Essonnes
Abstract :
We report on a novel thermal select (TS) MRAM with multilevel programming capability. Exchange bias pinning of a magnetic free layer (FL) was used to achieve a thermally stable bit and to reduce writing currents. This report shows experimental data for a TS-based magnetic tunnel junction (MTJ) with a size of 50 times90 nm2, the smallest size reported so far. Multilevel capability with 2 bits per 1-transistor and 1-MTJ (1T1MTJ) is also demonstrated on a 70 times 140 nm2 MTJ. With the advanced 2-bit cell concept, a 70% increase in effective bit density can be achieved at 65 nm technology node
Keywords :
magnetic storage; magnetic tunnelling; random-access storage; 2 bit; 65 nm; magnetic free layer; magnetic tunnel junction; multilevel programming; thermal select MRAM; transistor; writing currents; Heating; Magnetic tunneling; Manufacturing; Nonvolatile memory; Pulse circuits; Pulse measurements; Random access memory; Switches; Temperature; Writing;
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0439-8
Electronic_ISBN :
1-4244-0439-8
DOI :
10.1109/IEDM.2006.346986