DocumentCode :
2405030
Title :
Selective electro-less plating of SU-8 microstructures fabricated using two-photon polymerization
Author :
Yan, Yuanjun ; Bettiol, Andrew A.
Author_Institution :
Dept. of Phys., Nat. Univ. of Singapore, Singapore, Singapore
fYear :
2010
fDate :
14-16 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, we report a method for fabricating an array of 3D silver-coated polymer microstructures. The process involves three dimensional nanolithography using two-photon polymerization of SU-8 photoresist that has been spin coated onto a silicon substrate. The resulting polymer structures are selectively coated with silver using an electroless silver nitrate plating solution. We utilize a radio frequency plasma pretreatment process to modify the surface of the polymeric microstructures prior to electroless silver plating. Optimization of this pretreatment process allows us to selectively silver plate the polymer structures whilst leaving the silicon substrate uncoated. This technique opens up the possibility of fabricating true three dimensional metallic nanostructures for metamaterials and plasmonics applications.
Keywords :
electroless deposited coatings; nanolithography; photoresists; plasma materials processing; polymer structure; polymerisation; polymers; spin coating; two-photon processes; 3D nanolithography; 3D silver-coated polymer microstructure; Ag; SU-8 microstructure; SU-8 photoresist; Si; electroless silver nitrate plating solution; radio frequency plasma pretreatment process; silicon substrate; spin coating; two-photon polymerization; Coatings; Lithography; Plasmas; Polymers; Silicon; Silver; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Global Conference (PGC), 2010
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-9882-6
Type :
conf
DOI :
10.1109/PGC.2010.5705980
Filename :
5705980
Link To Document :
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