Application of focused ion beam for testing, repair and fabrication of metal and optical interconnections in wafer scale integration

Testing and repair methods using a focused ion beam (FIB) system are presented. An application of ion beam voltage contrast testing to the problem of checking line continuity and shorting is examined. A microfocused secondary ion mass spectrometer is used for verification of cuts produced from ion milling. The feasibility of using FIB to micromachine optical mirrors used in optical waveguides has been studied with very encouraging results. The versatility of FIB presents a unique opportunity for test and repair of wafer-scale metal wires as well as fabrication of microoptics for optical waveguides in a single high-yield processing step