• DocumentCode
    2410331
  • Title

    Effect of tapering on optical guiding and sideband growth in a finite-pulse free-electron laser

  • Author

    Hafizi, B. ; Ting, A. ; Sprangle, P. ; Tang, C.U.

  • Author_Institution
    US Naval Res. Lab., Washington, DC, USA
  • fYear
    1989
  • fDate
    20-23 Mar 1989
  • Firstpage
    1234
  • Abstract
    The results of a numerical study of a high-current approximately kiloampere high-power, approximately gigawatt, short wavelength, approximately micrometer, tapered-wiggler, free-electron laser are presented. The development of an optical pulse of finite axial extent is studied by means of a numerical code. It is found that increasing the tapering rate reduces refractive guiding, causing the optical wavefronts to become more convex, thus spreading the optical field into a larger cross section. This increases the output power and efficiency. Concomitant with this, there is a significant reduction in the sideband modulation of the optical field. It is also found that as the tapering rate is increased there is a gradual transition from a refractive-guiding regime to one where gain focusing dominates, with optical power diffracting laterally along the convex wavefronts. The increased transverse extent of the optical field, rather than an increase in the field amplitude, is the major reason for efficiency enhancement as the tapering rate is increased
  • Keywords
    free electron lasers; light refraction; 1 GW; 1 kA; 1 micron; efficiency; finite-pulse free-electron laser; gain focusing; optical field; optical guiding; optical pulse; output power; refractive guiding; sideband growth; tapering rate; Electron beams; Electron emission; Electron optics; Equations; Free electron lasers; Laser theory; Optical harmonic generation; Optical modulation; Optical refraction; Plasma waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE
  • Conference_Location
    Chicago, IL
  • Type

    conf

  • DOI
    10.1109/PAC.1989.73406
  • Filename
    73406