DocumentCode
2414232
Title
Embedded split-gate flash memory with silicon nanocrystals for 90nm and beyond
Author
Chindalore, Gowrishankar ; Yater, Jane ; Gasquet, Horacio ; Suhail, Mohammed ; Kang, Sung-Taeg ; Hong, Cheong Min ; Ellis, Nicole ; Rinkenberger, Glenn ; Shen, James ; Herrick, Matthew ; Malloch, Wendy ; Syzdek, Ronald ; Baker, Kelly ; Chang, Ko-Min
Author_Institution
Technol. Solutions Organ., Freescale Semicond., Inc., Austin, TX
fYear
2008
fDate
17-19 June 2008
Firstpage
136
Lastpage
137
Abstract
We present a split-gate based NOR flash memory array with silicon nanocrystals as the storage medium. 128 KB memory arrays have been evaluated with this technology and the results presented here show a nanocrystal memory that has been demonstrated to achieve a minimum 1.5 V operating window that is maintained through 10 K program/erase cycles; well controlled array threshold distributions; fast source-side injection programming (10-20 us); fast tunnel erase into the gate; and robust high temperature data retention for both uncycled and cycled arrays. Results presented here with focus on the array operation demonstrate the maturity of this technology for implementation into consumer, industrial, and automotive microcontrollers.
Keywords
NOR circuits; flash memories; integrated memory circuits; memory architecture; microcontrollers; nanostructured materials; nanotechnology; NOR flash memory array; array threshold distributions; automotive microcontrollers; consumer microcontrollers; data retention; industrial microcontrollers; nanocrystal memory; size 90 nm; source side injection programming; time 10 mus to 20 mus; tunnel erase; voltage 1.5 V; Dielectrics; Flash memory; Microcontrollers; Nanocrystals; Nonvolatile memory; Robust control; Silicon; Split gate flash memory cells; Temperature control; Temperature distribution; Data Retention; Endurance; Flash Memories; Memory Array; Microcontrollers; Nanocrystals; Source-side Injection; Tunnel Erase;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 2008 Symposium on
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-1802-2
Electronic_ISBN
978-1-4244-1803-9
Type
conf
DOI
10.1109/VLSIT.2008.4588592
Filename
4588592
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