DocumentCode :
241670
Title :
Mask optimization based on block non-uniform grid convolution
Author :
Xianhua Liang ; Jinyu Zhang ; Yaping Sun
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
A framework of optimizing mask of large size is developed. By partitioning the mask into blocks and processing each block with adaptive grid size, acceleration of 2D convolution and thus of mask optimization is achieved with tolerable accuracy loss. Simulation results show its correctness and flexibility in trade-off between speed and accuracy. The method in this paper can be theoretically proved and incorporated into a variety of inverse lithography frameworks, especially for those gradient-based.
Keywords :
convolution; lithography; masks; optimisation; 2D convolution acceleration; adaptive grid size; block nonuniform grid convolution; inverse lithography frameworks; mask optimization; mask partitioning; Abstracts; Convolution; Kernel; Optimization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021257
Filename :
7021257
Link To Document :
بازگشت