• DocumentCode
    242104
  • Title

    Transient simulation of nano-scale UTBB nmosfets by deterministically solving BTE

  • Author

    Shao-yan Dia ; Kai Zhao ; Tiao Lu ; Gang Du ; Xiao-yan Liu

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The transient response to the drain voltage of a nano scale Ultra-Thin Body and BOX (UTBB) nMOSFET are investigated by deterministically solving the time dependent Boltzmann Transport Equation (BTE). The relaxation process of subbands profile, electron density and current is investigated. The relaxation time of the device is about 0.1ps at typical biases, which is several times larger than the electron transit time.
  • Keywords
    MOSFET; transient response; BTE; device relaxation time; drain voltage; electron density; electron transit time; nano-scale UTBB nMOSFET; nanoscale ultrathin body-box nMOSFET; subband profile relaxation process; transient response; transient simulation; Abstracts; Acceleration; Educational institutions; Logic gates; MOSFET circuits; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021479
  • Filename
    7021479