DocumentCode
2422017
Title
Polynitrogen/Nanoaluminum Surface Interactions
Author
Boatz, Jerry A. ; Sorescu, Dan
Author_Institution
Space Missile Propulsion Div., US Air Force Res. Lab., Edwards, CA
fYear
2008
fDate
14-17 July 2008
Firstpage
247
Lastpage
251
Abstract
First-principles density functional theory (DFT) calculations using the generalized gradient approximation (GGA) have been performed to study the adsorption of a series of all-nitrogen and high-nitrogen compounds of increasing sizes and complexity on the Al(111) surface. The calculations employ periodic slab models with 4 Al layers, ranging in size from (3times3) to (5times5) surface unit cells, and containing up to 144 Al atoms. Complementary quantum chemical calculations, utilizing DFT and second-order perturbation theory methods, of the ground state potential energy surfaces of the corresponding polynitrogen/high nitrogen species in the absence of the aluminum surface also have been performed. The initial set of studies performed in the first year of this challenge project, which focused on the adsorption and reaction properties of Nx (x=1-5), NHx (x=1-3), N2Hx (x=1-4), N3H, N3H3, and N4H4 species on Al(111), have been extended to include larger polynitrogen systems such as N6, N8, N10, and N12. The C48N12 fullerene-like molecule was included in this series in place of N60, which was found to be unstable in the gas phase. Furthermore, simple nitrogen-containing heterocycles such as furazan (C2N2H2O), 2H-1,2,3- and 4H-1,2,4-triazole (C2N3H3), and 1H- and 2H-tetrazole (CN4H2) have been studied. Additional compounds of interest include the monosubstituted di(cyclopropyl )triazole (C11N6H12) and di(cyclobutyl)triazole (C13N5H16) derivatives of triazene. For these systems, surface interaction mechanisms involving both dissociative and nondissociative processes have been characterized as a function of molecular orientation and surface site. The - - dissociative mechanisms generally include elimination of one or more N2 molecules.
Keywords
ab initio calculations; adsorption; aluminium; density functional theory; dissociation; ground states; nanostructured materials; nitrogen; nitrogen compounds; organic compounds; perturbation theory; potential energy surfaces; surface chemistry; 1H-tetrazole (CN4H2); 2H-1,2,3- (C2N3H3); 2H-tetrazole (CN4H2); 4H-l,2,4-triazole (C2N3H3); Al; Al(111) surface; C2N2H2O; C48N12 fullerene-like molecule; DFT; GGA; N2Hx; N3H; N3H3; N4H4; Nx; NHx; adsorption; density functional theory; dissociative processes; first-principles calculations; gas phase; generalized gradient approximation; ground state potential energy surfaces; molecular orientation; nanoaluminum; polynitrogen; quantum chemical calculations; reaction properties; second-order perturbation theory; surface interaction mechanisms; Aluminum; Atomic layer deposition; Computational modeling; Density functional theory; Laboratories; Missiles; Nitrogen; Propulsion; Protection; Slabs;
fLanguage
English
Publisher
ieee
Conference_Titel
DoD HPCMP Users Group Conference, 2008. DOD HPCMP UGC
Conference_Location
Seattle, WA
Print_ISBN
978-1-4244-3323-0
Type
conf
DOI
10.1109/DoD.HPCMP.UGC.2008.58
Filename
4755873
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