Title :
A new program at RIT: master of engineering in microelectronics manufacturing engineering
Author :
Fuller, L.F. ; Hesler, K.H. ; Kurinec, S.K. ; Lane, R.L. ; Pearson, R.E. ; Smith, B.W. ; Turkman, I.R.
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
Abstract :
Rochester Institute of Technology, College of Engineering, has established a new master of engineering degree program in microelectronics manufacturing engineering. The program is one year (four quarters) in duration and is designed for BS graduates in engineering or science. The core courses are Microelectronics I, II, III, Microlithography I, II, and Manufacturing Science I, II. Concentration courses may be selected from a list of courses including computer integrated manufacturing, statistical design of experiments, facilities design, safety, and others. The core courses are discussed, and the facilities are described
Keywords :
educational courses; semiconductor device manufacture; Manufacturing Science; Microlithography; RIT; Rochester Institute of Technology; computer integrated manufacturing; core courses; facilities design; microelectronics manufacturing engineering; safety; statistical design; Chemistry; Educational institutions; Electronics industry; Fabrication; Maintenance engineering; Manufacturing; Microelectronics; Optical imaging; Optical scattering; Semiconductor device manufacture;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth
Conference_Location :
Westborough, MA
DOI :
10.1109/UGIM.1989.37315
