Title :
Plasma chemical reaction for nitric oxide and sulfur dioxide removal in corona discharge reactor
Author :
Dong, L.M. ; Lan, S. ; Yang, J.X. ; Chi, X.C.
Author_Institution :
Harbin Univ. of Sci. & Technol., China
Abstract :
Application of plasma chemistry for gas cleaning is gaining prominence in recent years, mainly from the energy consideration point of view. Normally, the gas treatment is carried out at or above room temperature by the conventional dry-type corona reactor. However, this treatment is still inadequate for the removal of certain stable gases present in the flue gas mixture. In this work, a wet-type corona reactor is presented that can simultaneously remove NO and SO2 at low temperatures and at atmospheric pressure. The experimental results show both removal rate of NO and SO2 are improved in wet-type reactor than that of dry-type reactor. NO is mostly oxidized into NO2 by the reaction with O and O3 and NO2 is change into HNO3 by the reaction with OH, which is generated from H2O. Most of the SO2 removal is attributed to the absorption into the water film and the enhancement by the discharge plasma is small.
Keywords :
air pollution control; cleaning; corona; gas mixtures; nitrogen compounds; oxidation; plasma chemistry; plasma materials processing; sulphur compounds; NO; SO2; atmospheric pressure; corona discharge reactor; flue gas mixture; gas cleaning; gas removal rate; low temperatures; oxides removal; plasma chemical reaction; plasma-activated desulfurization; pollution control; residence time; Chemical reactors; Chemical technology; Corona; Electron beams; Inductors; Nitrogen; Nuclear and plasma sciences; Plasma applications; Plasma chemistry; Plasma temperature;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 2003. Annual Report. Conference on
Print_ISBN :
0-7803-7910-1
DOI :
10.1109/CEIDP.2003.1254887