DocumentCode :
2430495
Title :
Design and process considerations for 1200V HVIC technology
Author :
Choi, Yongcheol ; Jeon, Changki ; Kim, Minsuk
Author_Institution :
Process Dev., Fairchild Korea Semicond., Pucheon, South Korea
fYear :
2009
fDate :
14-18 June 2009
Firstpage :
311
Lastpage :
314
Abstract :
A 1200 V LDMOS structure based on 600 V LDMOS technology has been developed for level shifters of industrial high side gate driver IC and SPMreg solution. For a 1200 V LDMOS, the two serious phenomena occurred such as walk-out of a few hundreds volts and burn-out at a few muA of drain current during breakdown measurement unlike 600 V LDMOS having rugged breakdown characteristics. In this work, these challenges were clearly solved by critical techniques and LDMOS showed stable breakdown voltage of about 1400 V without walk-out and burn-out phenomena. Here, the causes and prevention technics on these challenges are described in detail in this paper.
Keywords :
power integrated circuits; HVIC technology; LDMOS structure; LDMOS technology; breakdown measurement; process considerations; rugged breakdown characteristics; stable breakdown voltage; voltage 1200 V; voltage 1400 V; voltage 600 V; Breakdown voltage; Doping; Electric breakdown; Electric variables measurement; Implants; Low voltage; Process design; Silicon; Voltage control; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
Conference_Location :
Barcelona
ISSN :
1943-653X
Print_ISBN :
978-1-4244-3525-8
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2009.5158064
Filename :
5158064
Link To Document :
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