DocumentCode
2431118
Title
Linearity Limitations of AlGaN/GaN HFET´s
Author
Liu, Y. ; Trew, R.J. ; Bilbro, G.L. ; Kuang, W. ; Yin, H.
Author_Institution
Dept. of ECE, North Carolina State Univ., Raleigh, NC
fYear
2006
fDate
4-5 Dec. 2006
Firstpage
1
Lastpage
4
Abstract
Due to high mobility (1000-1500 cm/V2), high sheet charge density (~1013 cm-2), and high electron saturation velocity (~2.0times105 cm/s), AlGaN/GaN HFET´s were shown to have great potential for linear operation in high dynamic range module. However, significant linearity degradation was found in practical devices compared to that predicted from theoretic derivation. In this work it is demonstrated that nonlinear source resistance that varies in magnitude with the channel conduction current limits these device´s RF performance by suppressing the channel IMAX value and introducing nonlinearity under large signal operation. The nonlinear source resistance can be affected by changing the length of the gate-source access region. RF performance is improved by minimizing the nonlinearity in the source resistance.
Keywords
aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; HFET; charge density; electron saturation velocity; heterostructure field effect transistors; linearity degradation; nonlinear source resistance; Aluminum gallium nitride; Degradation; Dynamic range; Electron mobility; Gallium nitride; HEMTs; Linearity; MODFETs; RF signals; Radio frequency; AlGaN/GaN heterostructure field-effect transistors (HFETs); large-signal operation; nonlinear source resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Wireless and Microwave Technology Conference, 2006. WAMICON '06. IEEE Annual
Conference_Location
Clearwater Beach, FL
Print_ISBN
1-4244-0849-0
Electronic_ISBN
1-4244-0849-0
Type
conf
DOI
10.1109/WAMICON.2006.351914
Filename
4161076
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