• DocumentCode
    2434545
  • Title

    Properties of silicon thin films grown by the temperature difference method (TDM)

  • Author

    Thomas, B. ; Muller, G. ; Wilde, P.-M. ; Wawra, H.

  • Author_Institution
    Inst. fur Kristallzuchtung, Berlin, Germany
  • fYear
    1997
  • fDate
    29 Sep-3 Oct 1997
  • Firstpage
    771
  • Lastpage
    774
  • Abstract
    In this paper we describe the temperature difference method (TDM) as a promising technology for the continuous growth of thin film silicon from the solution on large area polycrystalline substrates (10×10 cm2). The thermodynamic driving force of the layer growth by TDM is generated by a temperature gradient perpendicular to the substrate surface. Silicon thin films have been grown from In/Ga-solutions at 980°C. A temperature gradient of 10 K/cm allows a growth rate of 0.3 μm/min. Doping concentrations from 1016 to 2×1018 cm-3 are adjustable. Minority charge carrier life times of 5-10 μs were determined in 30 μm thick layers by TRMC (time resolved microwave conductivity) measurements. Additionally first growth results of Si-LPE on silicon seeded substrates are presented
  • Keywords
    carrier lifetime; elemental semiconductors; high-frequency effects; liquid phase epitaxial growth; minority carriers; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; semiconductor thin films; silicon; solar cells; thermodynamics; 10 cm; 30 mum; 5 to 10 mus; 980 C; LPE; Si; doping concentrations; epitaxial layers; large area polycrystalline substrates; minority charge carrier life times; silicon thin film properties; temperature difference method; temperature gradient; thermodynamic driving force; thin film silicon growth; time resolved microwave conductivity measurements; Charge carriers; Conductivity; Doping; Semiconductor thin films; Silicon; Substrates; Temperature; Thermal force; Thermodynamics; Time division multiplexing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    0160-8371
  • Print_ISBN
    0-7803-3767-0
  • Type

    conf

  • DOI
    10.1109/PVSC.1997.654203
  • Filename
    654203