DocumentCode :
2435449
Title :
Application of a MASWP: Duo_Plasmaline next generation
Author :
Alberts, Lukas ; Kaiser, Mathias ; Hunyar, Christian ; Graf, Matthias ; Nauenburg, Klaus ; Räuchle, Eberhard
Author_Institution :
Fraunhofer ICT, Pfinztal
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Microwave based surface wave plasma reactors like those relying on the Duo-Plasmaline encounters large success in dielectric coating applications. But they show principal limitation to dielectric materials applications. We attempt here to present a Duo-Plasmaline NG based on the metal antenna SWP. This design would circumvent the dielectric coating limitation. The propagation length of the plasma will be reported as a function of gas pressure, microwave power and bias potential for different atmospheres like argon, nitrogen and oxygen. The plasma homogeneity will be reflected in the coating thickness evolution of a PECVD thin film along the antenna.
Keywords :
argon; nitrogen; oxygen; plasma CVD; plasma CVD coatings; plasma sources; Ar; Duo-Plasmaline; N2; O2; PECVD thin film; bias potential; dielectric coating; gas pressure; metal antenna; microwave power; plasma homogeneity; plasma propagation length; surface wave plasma reactors; Antennas and propagation; Coatings; Dielectric materials; Dielectric thin films; Inductors; Microwave propagation; Plasma applications; Plasma materials processing; Plasma waves; Surface waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4590673
Filename :
4590673
Link To Document :
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