DocumentCode
2441256
Title
Polymer optical interconnect technologies for polylithic gigascale integration
Author
Mule, Anthony V. ; Joseph, Paul J. ; Allen, Sue-Ann B. ; Kohl, Paul A. ; Gaylord, Thomas K. ; Meindl, James D.
Author_Institution
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2003
fDate
16-18 Sept. 2003
Firstpage
119
Lastpage
122
Abstract
Polymer optical waveguides embedded within buried air-gap cladding regions are presented as part of a wafer-level packaging technology for polylithic integration of optical interconnection with CMOS microelectronics. Functional 5 /spl mu/m wide/25 /spl mu/m pitch optical channels with dielectric/air core/cladding regions exhibit 0.43-1.22 dB/cm. scattering losses for unpassivated and passivated channels. A 1/spl times/4 multimode interference (MMI) power splitter constructed from the same polymer material exhibits 0.23-1.3 dB output power non-uniformity. Volume grating couplers constructed from a second photopolymer material exhibit /spl sim/72% input coupling efficiency.
Keywords
heat sinks; optical couplers; optical interconnections; optical planar waveguides; optical polymers; passivation; thermal management (packaging); CMOS microelectronics; buried air-gap cladding regions; heat sink; multimode interference power splitter; optical interconnection; optoelectronic chips; passivated channels; polylithic integration; polymer optical waveguides; refractive index contrast; scattering losses; sea-of-leads package; unpassivated channels; volume grating couplers; wafer-level packaging technology; Air gaps; CMOS technology; Dielectric materials; Integrated optics; Optical interconnections; Optical materials; Optical polymers; Optical scattering; Optical waveguide components; Optical waveguides;
fLanguage
English
Publisher
ieee
Conference_Titel
European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
Conference_Location
Estoril, Portugal
Print_ISBN
0-7803-7999-3
Type
conf
DOI
10.1109/ESSDERC.2003.1256825
Filename
1256825
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