DocumentCode :
2441544
Title :
Compact modeling of nanoscale MOSFETs in the ballistic limit
Author :
Jiménez, D. ; Sáenz, J.J. ; Iñiguez, B. ; Suñe, J. ; Marsal, L.F. ; Pallarés, J.
Author_Institution :
Departament d´´Enginyeria Electronica, Autonomous Univ. of Barcelona, Bellaterra, Spain
fYear :
2003
fDate :
16-18 Sept. 2003
Firstpage :
187
Lastpage :
190
Abstract :
We present a compact model based on the Landauer transmission theory for the silicon quantum wire/well metal-oxide-semiconductor field effect transistor (MOSFET) working in the ballistic limit. This model captures the static current-voltage characteristics in all the operation regimes, below and above threshold voltage. The model provides a basic framework to account for the electronic transport in MOSFETs, being easily adaptable to gate structures as the double-gate (DG) or gate-all-around (GAA). Numerical simulations based on the proposed model have been compared with quantum mechanical self-consistent simulations and experimental results, with good agreement.
Keywords :
Fermi level; MOSFET; ballistic transport; nanoelectronics; quantum well devices; semiconductor device models; Landauer transmission theory; ballistic limit; barrier height; compact model; electronic transport; nanoscale MOSFET; nanoscale transistors; numerical simulations; quantum wire/well MOSFET; static current-voltage characteristics; threshold voltage; Electrodes; Electrons; Electrostatics; MOSFETs; Particle scattering; Rough surfaces; Semiconductor films; Silicon; Surface roughness; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
Conference_Location :
Estoril, Portugal
Print_ISBN :
0-7803-7999-3
Type :
conf
DOI :
10.1109/ESSDERC.2003.1256842
Filename :
1256842
Link To Document :
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