DocumentCode
2443591
Title
3D-microfluidic device to remove zona pellucida fabricated by Mask-less exposure technology
Author
Yamanishi, Yoko ; Nakano, Takuma ; Sawada, Yu ; Itoga, Kazuyoshi ; Okano, Teruo ; Arai, Fumihito
Author_Institution
Dept. of Mech. Sci. & Eng., Nagoya Univ., Nagoya, Japan
fYear
2010
fDate
21-22 Dec. 2010
Firstpage
260
Lastpage
265
Abstract
This paper presents a novel method of three-dimensional fabrication using Mask-less exposure equipment and a three dimensional microfluidic application for the cell manipulation. The grayscale data can directly control the height of the photoresist to be exposed without using any mask. Three-dimensional microchannel was successfully fabricated simply by using the low cost exposure system with the height range of 0-200 μm. We have succeeded in removing the zona pellucida of oocyte passing through the 3D-microchannel whose cross section is gradually restricted along the path to provide mechanical stimuli on the surface of the oocyte in every direction. This microfluidic chip contributes to the effective high throughput of the peeled oocyte without damaging them.
Keywords
bioMEMS; cellular biophysics; lab-on-a-chip; microfluidics; photoresists; 3D-microfluidic device; cell manipulation; mask-less exposure technology; microfluidic chip; oocyte surface; photoresist; zona pellucida; Glass; Gray-scale; Lithography; Microchannel; Microfluidics; Resists; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
System Integration (SII), 2010 IEEE/SICE International Symposium on
Conference_Location
Sendai
Print_ISBN
978-1-4244-9316-6
Type
conf
DOI
10.1109/SII.2010.5708335
Filename
5708335
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