Title :
Table of contents
Abstract :
The following topics are dealt with: NAND flash memory; strain technology; nonvolatile memory; integrated circuit interconnection; CMOS; next generation lithography; and high mobility channel.
Keywords :
CMOS integrated circuits; NAND circuits; flash memories; integrated circuit interconnections; random-access storage; CMOS; NAND flash memory; high mobility channel; integrated circuit interconnection; next generation lithography; nonvolatile memory; strain technology;
Conference_Titel :
VLSI Technology, Systems, and Applications, 2009. VLSI-TSA '09. International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-2784-0
DOI :
10.1109/VTSA.2009.5159263
