• DocumentCode
    2467445
  • Title

    Multiple beam electron gun development for high-power amplifiers

  • Author

    Nguyen, K.T. ; Pershing, D.E. ; Pasour, J. ; Petillo, J.

  • Author_Institution
    KN Res., Silver Spring, MD, USA
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    168
  • Lastpage
    169
  • Abstract
    A very attractive class of amplifiers that has the potential to provide high RF power at low beam voltage uses multiple electron beams rather than the single beam of conventional devices. These multiple beam amplifiers (MBAs) typically have individual beam channels with a common RF interaction region. A multiple beam klystron (MBK) illustrates the concept. In such a scheme, individual beamlets have parameters similar to those in conventional, single-beam amplifiers, while multiplying the output power by approximately the number of beamlets. The important result is that the operating voltage and space charge limitations for each beamlet are essentially unchanged, yet the output power can be much greater than that of a corresponding single-beam device. Furthermore, the overall high perveance characteristic of the MBA permits large bandwidth operation, while the low perveance of the individual beamlet enables high efficiency operation.
  • Keywords
    electron guns; klystrons; microwave power amplifiers; RF power; high-power amplifier; multiple beam amplifier; multiple beam electron gun; multiple beam klystron; Bandwidth; Electron beams; High power amplifiers; Klystrons; Low voltage; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Space charge;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2002. IVEC 2002. Third IEEE International
  • Print_ISBN
    0-7803-7256-5
  • Type

    conf

  • DOI
    10.1109/IVELEC.2002.999318
  • Filename
    999318