DocumentCode
2467445
Title
Multiple beam electron gun development for high-power amplifiers
Author
Nguyen, K.T. ; Pershing, D.E. ; Pasour, J. ; Petillo, J.
Author_Institution
KN Res., Silver Spring, MD, USA
fYear
2002
fDate
2002
Firstpage
168
Lastpage
169
Abstract
A very attractive class of amplifiers that has the potential to provide high RF power at low beam voltage uses multiple electron beams rather than the single beam of conventional devices. These multiple beam amplifiers (MBAs) typically have individual beam channels with a common RF interaction region. A multiple beam klystron (MBK) illustrates the concept. In such a scheme, individual beamlets have parameters similar to those in conventional, single-beam amplifiers, while multiplying the output power by approximately the number of beamlets. The important result is that the operating voltage and space charge limitations for each beamlet are essentially unchanged, yet the output power can be much greater than that of a corresponding single-beam device. Furthermore, the overall high perveance characteristic of the MBA permits large bandwidth operation, while the low perveance of the individual beamlet enables high efficiency operation.
Keywords
electron guns; klystrons; microwave power amplifiers; RF power; high-power amplifier; multiple beam amplifier; multiple beam electron gun; multiple beam klystron; Bandwidth; Electron beams; High power amplifiers; Klystrons; Low voltage; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Space charge;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2002. IVEC 2002. Third IEEE International
Print_ISBN
0-7803-7256-5
Type
conf
DOI
10.1109/IVELEC.2002.999318
Filename
999318
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