Title :
Monitoring Thin-Film Etching Using Surface Acoustic Waves
Keywords :
Acoustic waves; Delay lines; Etching; Monitoring; Oscillators; Plasma applications; Plasma materials processing; Resists; Surface acoustic waves; Transistors;
Conference_Titel :
IEEE 1987 Ultrasonics Symposium
Conference_Location :
Denver, Colorado, USA
DOI :
10.1109/ULTSYM.1987.199028
