Title :
Automatic dose optimization system for resist cross-sectional profile in a electron beam lithography
Author :
Hirai, Y. ; Kikuta, H. ; Okano, M. ; Yotsuya, T. ; Yamamoto, K.
Author_Institution :
Osaka Prefecture Univ., Japan
Abstract :
An automatic dose optimization system for electron beam lithography is newly developed to get a specified resist cross-sectional profiles. The system takes into account not only the proximity effect but also resist development process. It is experimentally demonstrated that the newly proposed method is superior to the conventional method to fabricate saw teeth like blazed grating pattern for optical diffraction devices.
Keywords :
diffraction gratings; electron beam lithography; electron resists; optical fabrication; proximity effect (lithography); automatic dose optimization system; development process; electron beam lithography; fabrication; optical diffraction device; proximity effect; resist cross-sectional profile; saw teeth blazed grating; Electron beams; Electronic mail; Gratings; Lithography; Optical devices; Optical scattering; Proximity effect; Resists; Teeth; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872677
