DocumentCode
2474448
Title
Influence of drift region on the 1/f noise in LDMOS
Author
Dikshit, A.A. ; Subramanian, Venkatachalam ; Pandharpure, S.J. ; Sirohi, Saurabh ; Letavic, Theodore J.
Author_Institution
Semicond. R & D Center, IBM India Pvt. Ltd., Bangalore, India
fYear
2012
fDate
3-7 June 2012
Firstpage
315
Lastpage
318
Abstract
The effect of drift region on the flicker noise in LDMOS devices in the linear and saturation regions is analyzed using measured data and device simulations. In the linear region, noise in the drift region arises from gate-drain overlap region and is significant for longer channel length devices. For shorter channel length devices, the sub-surface current flow in the gate-drain overlap region reduces the contribution of noise from the drift region. In the saturation region, noise is dependent on quasi-saturation condition, and reaches its lowest value only when the channel is saturated.
Keywords
1/f noise; MOS integrated circuits; 1/f noise; LDMOS devices; channel length devices; drift region; flicker noise; gate-drain overlap region; quasi-saturation condition; subsurface current flow; 1f noise; Immune system; Logic gates; MOSFET circuits; Noise measurement; Standards; LDMOS; Power MOSFET; drift-region; flicker noise; quasi-saturaion;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location
Bruges
ISSN
1943-653X
Print_ISBN
978-1-4577-1594-5
Electronic_ISBN
1943-653X
Type
conf
DOI
10.1109/ISPSD.2012.6229086
Filename
6229086
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