• DocumentCode
    2474576
  • Title

    Impact of buffer composition on the dynamic on-state resistance of high-voltage AlGaN/GaN HFETs

  • Author

    Hilt, Oliver ; Bahat-Treidel, Eldad ; Cho, Eunjung ; Singwald, Sebastian ; Würfl, Joachim

  • Author_Institution
    Leibniz-Inst. fuer Hoechstfrequenztechnik, Ferdinand-Braun-Inst., Berlin, Germany
  • fYear
    2012
  • fDate
    3-7 June 2012
  • Firstpage
    345
  • Lastpage
    348
  • Abstract
    Switching experiments with normally-off GaN-HFETs using a carbon-doped GaN buffer or an AlGaN buffer showed very different magnitudes of increased dynamic on-state resistance. The dynamic on-state resistance is analyzed for variations in buffer composition and set into relation to the buffer voltage-blocking strength. Also, the impact of p-GaN gate normally-off and Schottky-gate normally-on device technologies on the dispersion is studied. It is concluded that a buffer with less trap sites and lower breakdown strength is more favorable for high-voltage switching than a buffer with incorporated acceptors to increase the buffer breakdown strength.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; Schottky-gate normally-on device technology; buffer composition; buffer voltage-blocking strength; dynamic on-state resistance; high-voltage HFET; p-GaN gate normally-off; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Switches; GaN; dispersion; dynamic on-state resistance; normally off; switching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
  • Conference_Location
    Bruges
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4577-1594-5
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • DOI
    10.1109/ISPSD.2012.6229092
  • Filename
    6229092