DocumentCode
2474576
Title
Impact of buffer composition on the dynamic on-state resistance of high-voltage AlGaN/GaN HFETs
Author
Hilt, Oliver ; Bahat-Treidel, Eldad ; Cho, Eunjung ; Singwald, Sebastian ; Würfl, Joachim
Author_Institution
Leibniz-Inst. fuer Hoechstfrequenztechnik, Ferdinand-Braun-Inst., Berlin, Germany
fYear
2012
fDate
3-7 June 2012
Firstpage
345
Lastpage
348
Abstract
Switching experiments with normally-off GaN-HFETs using a carbon-doped GaN buffer or an AlGaN buffer showed very different magnitudes of increased dynamic on-state resistance. The dynamic on-state resistance is analyzed for variations in buffer composition and set into relation to the buffer voltage-blocking strength. Also, the impact of p-GaN gate normally-off and Schottky-gate normally-on device technologies on the dispersion is studied. It is concluded that a buffer with less trap sites and lower breakdown strength is more favorable for high-voltage switching than a buffer with incorporated acceptors to increase the buffer breakdown strength.
Keywords
III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; Schottky-gate normally-on device technology; buffer composition; buffer voltage-blocking strength; dynamic on-state resistance; high-voltage HFET; p-GaN gate normally-off; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Switches; GaN; dispersion; dynamic on-state resistance; normally off; switching;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location
Bruges
ISSN
1943-653X
Print_ISBN
978-1-4577-1594-5
Electronic_ISBN
1943-653X
Type
conf
DOI
10.1109/ISPSD.2012.6229092
Filename
6229092
Link To Document