DocumentCode :
2474576
Title :
Impact of buffer composition on the dynamic on-state resistance of high-voltage AlGaN/GaN HFETs
Author :
Hilt, Oliver ; Bahat-Treidel, Eldad ; Cho, Eunjung ; Singwald, Sebastian ; Würfl, Joachim
Author_Institution :
Leibniz-Inst. fuer Hoechstfrequenztechnik, Ferdinand-Braun-Inst., Berlin, Germany
fYear :
2012
fDate :
3-7 June 2012
Firstpage :
345
Lastpage :
348
Abstract :
Switching experiments with normally-off GaN-HFETs using a carbon-doped GaN buffer or an AlGaN buffer showed very different magnitudes of increased dynamic on-state resistance. The dynamic on-state resistance is analyzed for variations in buffer composition and set into relation to the buffer voltage-blocking strength. Also, the impact of p-GaN gate normally-off and Schottky-gate normally-on device technologies on the dispersion is studied. It is concluded that a buffer with less trap sites and lower breakdown strength is more favorable for high-voltage switching than a buffer with incorporated acceptors to increase the buffer breakdown strength.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; Schottky-gate normally-on device technology; buffer composition; buffer voltage-blocking strength; dynamic on-state resistance; high-voltage HFET; p-GaN gate normally-off; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Switches; GaN; dispersion; dynamic on-state resistance; normally off; switching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location :
Bruges
ISSN :
1943-653X
Print_ISBN :
978-1-4577-1594-5
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2012.6229092
Filename :
6229092
Link To Document :
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