Title :
Why are low-temperature MBE grown semiconductors important for an all-solid-state ultrafast laser technology?
Author_Institution :
Inst. for Quantum Electron., Swiss Federal Inst. of Technol., Zurich, Switzerland
fDate :
29 Apr-3 May 1996
Abstract :
We generate pulses from nanoseconds to 10 fs by varying the semiconductor saturable absorber and laser cavity design. In the long pulse regime with pulses as short as 180 ps, we rely on passive Q-switching. In the picosecond regime, we use the fast saturable absorber modelocking technique, and in the femtosecond regime, the semiconductor saturable absorber stabilizes soliton modelocking. In all cases, we benefit from the large design freedom of the antiresonant Fabry-Perot saturable absorber (A-FPSA) concept using low-temperature MBE growth to artificially adjust the physical parameters such as recovery times, saturation fluence, saturation intensity, insertion loss and modulation depth
Keywords :
Fabry-Perot resonators; Q-switching; high-speed optical techniques; laser cavity resonators; laser mode locking; molecular beam epitaxial growth; optical losses; optical modulation; optical saturable absorption; optical solitons; semiconductor growth; semiconductor lasers; 1 ns to 10 fs; 180 ps; all-solid-state ultrafast laser technology; antiresonant Fabry-Perot saturable absorber; fast saturable absorber modelocking technique; femtosecond regime; insertion loss; laser cavity design; long pulse regime; low-temperature MBE grown semiconductors; low-temperature MBE growth; modulation depth; nanoseconds; passive Q-switching; picosecond regime; pulses; recovery times; saturation fluence; saturation intensity; semiconductor saturable absorber; soliton modelocking; Fabry-Perot; Laser modes; Mirrors; Optical pulse generation; Semiconductor lasers; Solid lasers; Solid modeling; Solitons; Tellurium; Ultrafast optics;
Conference_Titel :
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Conference_Location :
Toulouse
Print_ISBN :
0-7803-3179-6
DOI :
10.1109/SIM.1996.571109