• DocumentCode
    2490844
  • Title

    Electrical modeling and characterization of through silicon vias (TSV)

  • Author

    Hu, Jin ; Wang, Lingqiu ; Jin, Lifeng ; Hao Zheng JiangNan

  • Author_Institution
    Res. Inst. of Comput. Technol., Wuxi, China
  • Volume
    2
  • fYear
    2012
  • fDate
    5-8 May 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Through silicon via (TSV) is becoming a promising method to achieve high density 3-dimensional integrated circuit (3D IC) system. In this paper, the electrical modeling and characterization of TSVs is studied. An equivalent RLGC model of TSVs and the analytic equation of the lumped model parameter are introduced. The electrical characterization of TSVs is analyzed in frequency domain and time domain. For the frequency domain analysis, the S parameters from the RLGC model and 3D field solver are well matched, which demonstrates the validity of the proposed RLGC model. The effect of TSVs geometric parameters on signal transmission characteristic is also discussed. For the time domain analysis, the eye diagram simulation is performed to estimate electrical performance of TSVs channel.
  • Keywords
    S-parameters; frequency-domain analysis; integrated circuit modelling; three-dimensional integrated circuits; time-domain analysis; 3D IC system; 3D field solver; S parameters; analytic equation; electrical characterization; electrical modeling; electrical performance; equivalent RLGC model; eye diagram simulation; frequency domain analysis; geometric parameters; high density 3-dimensional integrated circuit; lumped model parameter; signal transmission characteristic; through silicon vias; time domain analysis; Analytical models; Insertion loss; Integrated circuit modeling; Mathematical model; Silicon; Solid modeling; Through-silicon vias; RLGC model; Through silicon via (TSV); eye diagram; insertion loss; return loss;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology (ICMMT), 2012 International Conference on
  • Conference_Location
    Shenzhen
  • Print_ISBN
    978-1-4673-2184-6
  • Type

    conf

  • DOI
    10.1109/ICMMT.2012.6230044
  • Filename
    6230044