DocumentCode
2490887
Title
Analysis of deep etched trench in planar optical waveguide by FDTD method
Author
Wang, Jun ; Li, Mingyu ; He, Jian-Jun
Author_Institution
Zhejiang Univ., Hangzhou
fYear
2007
fDate
17-19 Oct. 2007
Firstpage
218
Lastpage
220
Abstract
A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the transfer matrix method (TMM) are compared. The effect of sidewall verticality is analyzed.
Keywords
etching; finite difference time-domain analysis; optical planar waveguides; transfer function matrices; FDTD method; deep etched trench; finite-difference time-domain method; planar optical waveguide; sidewall verticality; transfer matrix method; Etching; Finite difference methods; Optical buffering; Optical filters; Optical planar waveguides; Optical waveguides; Planar waveguides; Propagation losses; Time domain analysis; Transmission line matrix methods;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication and Optoelectronics Conference, 2007 Asia
Conference_Location
Shanghai
Print_ISBN
978-0-9789217-2-9
Electronic_ISBN
978-0-9789217-2-9
Type
conf
DOI
10.1109/AOE.2007.4410758
Filename
4410758
Link To Document