DocumentCode :
2498559
Title :
Measurement of parameters of thin film semiconductor structures by means of help millimeter waves
Author :
Lyubchenko, V.E. ; Meriakri, V.V. ; Chigrai, E.E.
Author_Institution :
Inst. of Radioeng. & Electron., Russian Acad. of Sci., Moscow, Russia
fYear :
2004
fDate :
13-17 Sept. 2004
Firstpage :
619
Lastpage :
620
Abstract :
A new method based on application of millimeter waves for measurement of complex refractive index of thin semiconductor films on high resistive substrates is described.
Keywords :
millimetre wave measurement; refractive index measurement; semiconductor thin films; complex refractive index measurement; high resistive substrates; millimeter wave application; thin film semiconductor structure parameters measurement; Artificial intelligence; Gallium nitride; Millimeter wave measurements; Semiconductor thin films; Solids; Sun;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology, 2004. CriMico 2004. 2004 14th International Crimean Conference on
Print_ISBN :
966-7968-69-3
Type :
conf
DOI :
10.1109/CRMICO.2004.183364
Filename :
1390346
Link To Document :
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