Title :
Flip-chip packaging with micromachined conductive polymer bumps
Author :
Oh, Kwang W. ; Ahn, Chong H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
Abstract :
A new conductive polymer flip-chip bonding technique has been developed and characterized using micromachined conductive polymer bumps. By using UV-based photolithography with thick photoresists, molds for the flip-chip bumps have been patterned, filled with conductive polymers, selectively cured, and then stripped, leaving molded conductive polymer bumps on contact metal pads. After flip-chip bonding with the micromachined conductive polymer bumps, the contact resistances measured for 25 μm-high bumps with 300 μm×300 μm area and 400 μm×400 μm area were 35 mΩ and 12 mΩ, respectively. The conductive polymer flip-chip bonding technique developed in this work showed a very low contact resistance, simple processing steps, a high bumping alignment resolution (<±5 μm), and a lower bonding temperature (~170°C)
Keywords :
conducting polymers; contact resistance; etching; filled polymers; flip-chip devices; heat treatment; integrated circuit bonding; integrated circuit packaging; microassembling; micromachining; moulding; photoresists; ultraviolet lithography; 12 mohm; 170 C; 25 micron; 300 micron; 35 mohm; 400 micron; UV-based photolithography; bonding temperature; bump area; bump height; bumping alignment resolution; conductive polymer flip-chip bonding technique; conductive polymer mold-filling; conductive polymers; contact metal pads; contact resistance; contact resistances; flip-chip bonding; flip-chip bump molds; flip-chip packaging; micromachined conductive polymer bumps; mold patterning; molded conductive polymer bumps; selective curing; stripping; thick photoresists; Area measurement; Bonding; Conductivity measurement; Contact resistance; Electrical resistance measurement; Lithography; Packaging; Polymers; Resists; Temperature;
Conference_Titel :
Adhesive Joining and Coating Technology in Electronics Manufacturing, 1998. Proceedings of 3rd international Conference on
Conference_Location :
Binghamton, NY
Print_ISBN :
0-7803-4934-2
DOI :
10.1109/ADHES.1998.742031