Solar cell manufacturing technology in Japan

Author

Kobayashi, T. ; Kimura, M. ; Kato, Y. ; Amano, S. ; Nakashima, Y. ; Yoshikawa, S. ; Sugimoto, H.

Author_Institution

Minist. of Int. Trade & Ind., Tokyo, Japan

fYear

1988

fDate

1988

Firstpage

1364

Abstract

Achievements and future projects in the fields of polycrystalline and amorphous silicon solar cell manufacturing technologies in Japan are discussed. The target and status of poly-Si solar cell developments in the areas of silicon materials, cast wafers, sheet wafers, and cell fabrication are presented. The target and status of a-Si solar cell development in such areas as high-quality large-area cells, high-productivity low-cost transparent conductive films, and high reliability are also presented.

Keywords

amorphous semiconductors; elemental semiconductors; silicon; solar cells; Japan; Si; a-Si solar cell; cast wafers; cell fabrication; high reliability; high-quality large-area cells; low-cost transparent conductive films; manufacturing technology; poly-Si solar cell; semiconductor; sheet wafers; solar cells; Amorphous silicon; Conducting materials; Conductive films; Costs; Fabrication; Fluidization; Inductors; International trade; Manufacturing; Manufacturing industries; Photovoltaic cells; Production; Research and development; Sheet materials; Solar power generation;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE

Conference_Location

Las Vegas, NV, USA

Type

conf

DOI

10.1109/PVSC.1988.105929

Filename

105929