DocumentCode :
2511439
Title :
RF Reactively Sputtered Aluminum Nitride Thin Films
Author :
Kumar, N. ; Pourrezaei, K. ; Singh, B. ; DeMaria, R.J.
fYear :
1986
fDate :
8-11 June 1986
Firstpage :
86
Lastpage :
88
Keywords :
Aluminum nitride; Argon; Nitrogen; Piezoelectric films; Plasma temperature; Radio frequency; Semiconductor films; Silicon; Sputtering; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics. 1986 Sixth IEEE International Symposium on
Conference_Location :
Bethlehem, PA, USA
Type :
conf
DOI :
10.1109/ISAF.1986.201101
Filename :
1538041
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2511439
