DocumentCode
25179
Title
Total Ionizing Dose Tolerance of
based Programmable Metallization Cells
Author
Dandamudi, P. ; Kozicki, M.N. ; Barnaby, H.J. ; Gonzalez-Velo, Y. ; Holbert, K.E.
Author_Institution
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Volume
61
Issue
4
fYear
2014
fDate
Aug. 2014
Firstpage
1726
Lastpage
1731
Abstract
Programmable Metallization Cells (PMC) are two-terminal elements that exhibit resistance switching based on the combination of bias dependent ion conduction through a solid-state electrolyte and reduction/oxidation (redox) reactions occurring at the electrode terminals. PMC based resistive random access memory (ReRAM) is currently used in emerging nonvolatile memory technologies and has the potential to be the successor of current flash memory. In this study we demonstrate the radiation tolerance of Ag-doped Ge40S60 based PMC elements that were irradiated up to a total ionizing dose (TID) of 10 Mrad(Ge40S60) using 60Co gamma rays. The irradiation tests on the PMC devices, with two different Ag anode thicknesses (35 nm and 100 nm), show no significant degradation in the resistance switching characteristics.
Keywords
Ge-Si alloys; electrical resistivity; electrodes; germanium compounds; radiation hardening (electronics); random-access storage; silver; tolerance analysis; Ag-Ge40S60; ReRAM; bias dependent ion conduction; electrode terminals; gamma rays; nonvolatile memory technologies; programmable metallization cells; redox reactions; reduction-oxidation reactions; resistance switching; resistive random access memory; solid state electrolyte; total ionizing dose tolerance; two terminal elements; Anodes; Cathodes; Metallization; Resistance; Silver; Switches; CBRAM; RRAM; ReRAM; chalcogenide glass; non-volatile memory; programmable metallization cells; radiation hard; total ionizing dose;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2014.2304634
Filename
6762812
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