Title :
Integration of multimode interference device with electroabsorption modulators as simple switches
Author :
Lee, S.Y. ; Yang, H. ; Li, Y.C. ; Mei, T.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
A 1×2 multimode interference device is monolithically integrated to two electroabsorption modulator based switches at the output ports by means of quantum-well intermixing. At the wavelength range of 1550-1570nm, both arms act as separate DC switches which can be modulated with the extinction ratios of up to 10dB. Monolithic integration of active and passive photonic components is attractive due to its miniaturized size which can simultaneously satisfy multifunctional purposes. The potential of compacted optical circuits along with low-cost batch fabrications and high stability ensures the viability of such endeavours. The integration of an MMI device (passive device) with EAMs (active devices) enables it to be used as a compact multiplexer or optical transmitter. The prototype made is of a relatively larger size (~2000μm) but its size can be potentially reduced to around 500μm or less. The material structure employed is the InGaAlAs/InGaAlAs MQW with dual depletion structure (DDR) and large optical cavity (LOC) structure design. The LOC material structure was designed for the realization of lower insertion loss. The QWI technology utilized here is the impurity-free vacancy diffusion (IFVD) method and it resulted in a 56nm blue-shift in the bandgap structure. The etching process executed here was the dry etching process using inductively coupled plasma (ICP) etching based on a CH4/Cl2/H2 gas combination. The MMI length is 1150μm whereas the modulators are both 500μm long.
Keywords :
III-V semiconductors; aluminium compounds; diffusion; electro-optical modulation; electroabsorption; energy gap; extinction coefficients; gallium arsenide; indium compounds; integrated optics; light interference; multiplexing equipment; optical design techniques; optical losses; optical switches; optical transmitters; semiconductor quantum wells; spectral line shift; sputter etching; DC switches; InGaAlAs-InGaAlAs; MMI device; active photonic components; bandgap structure; blue-shift; compact multiplexer; compacted optical circuits; dry etching; dual depletion structure; electroabsorption modulators; extinction ratios; impurity-free vacancy diffusion; inductively coupled plasma etching; insertion loss; low-cost batch fabrications; material structure; monolithic integration; multimode interference device integration; optical cavity structure; optical transmitter; passive photonic components; quantum-well intermixing; wavelength 1550 nm to 1570 nm; Materials; Modulation; Optical device fabrication; Optical fibers; Optical polarization; Quantum well devices; InGaAlAs MQW; component; electroabsorption modulator; large optical cavity; multimode interference device; quantum well intermixing;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713521