Title :
Analysis of ellipsometric data for nano transparent film
Author :
Zhao, Yuan ; Sheng, Ming-Yu
Author_Institution :
Dept. of Opt. & Electr., Shanghai Second Polytech. Univ., Shanghai, China
Abstract :
Nano transparent film is widely used in the areas of photovoltaic, nanophotonics and microelectronics. The optical parameters of nano transparent film is studies by the modified ellipsometric method. In the traditional analysis of ellipsometric data, the incident light is considered as a definite plane wave. But in reality, the incident light is a finite spatial extend wavepack. Therefore, the longitude shifts due to the thickness of dielectric film, and its effect on the normalized intensity of multiple reflected wave packets in single dielectric film exit. Using the modified ellipsometry, the analysis is of high accuracy and show the result which is in good agreement with experimentally measured data.
Keywords :
dielectric thin films; ellipsometry; nanostructured materials; optical films; transparency; definite plane wave; dielectric films; ellipsometric data; finite spatial extend wavepack; incident light; longitude shifts; multiple reflected wave packets; nanotransparent film; normalized intensity; optical parameters; Optical films; Optical polarization; Optical reflection; Optical surface waves; Optical variables control; Refractive index; Ellipsometry; Thin films;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713598