• DocumentCode
    2519980
  • Title

    Investigation of ESD Performance in Silicon Integrated Passive Devices

  • Author

    Lin, Yaojian ; Chelvam, M. Pandi ; Liu, Kai ; Robert, C.F.

  • Author_Institution
    STATS ChipPAC, Ltd., Singapore, Singapore
  • fYear
    2008
  • fDate
    9-12 Dec. 2008
  • Firstpage
    1005
  • Lastpage
    1010
  • Abstract
    ESD failure limits have been measured in a variety of silicon integrated passive devices using the Human Body Discharge Model. The failure mechanism for these circuits is typically the destructive breakdown of the thin insulator layer in metal-insulator-metal capacitors. The capacitors in this particular technology have a static breakdown of 70 to 100 V. Failure from ESD events for a single capacitor typically occurs for voltages of 200 to 300 V. Tests of more complex circuits show that the ESD performance is extended by using series arrangements of capacitors. In some circuit types it is possible to use inductive shunt protection. This has been found to increase the failure voltage to above 3KV, which was the limit of the test equipment.
  • Keywords
    MIM devices; capacitors; electrostatic discharge; elemental semiconductors; semiconductor device breakdown; silicon; ESD; Si; destructive breakdown; failure mechanism; human body discharge model; metal-insulator-metal capacitors; silicon integrated passive devices; thin insulator layer; voltage 200 V to 300 V; Biological system modeling; Breakdown voltage; Circuit testing; Electric breakdown; Electrostatic discharge; Failure analysis; Humans; Integrated circuit measurements; MIM capacitors; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference, 2008. EPTC 2008. 10th
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-2117-6
  • Electronic_ISBN
    978-1-4244-2118-3
  • Type

    conf

  • DOI
    10.1109/EPTC.2008.4763561
  • Filename
    4763561