DocumentCode
2519980
Title
Investigation of ESD Performance in Silicon Integrated Passive Devices
Author
Lin, Yaojian ; Chelvam, M. Pandi ; Liu, Kai ; Robert, C.F.
Author_Institution
STATS ChipPAC, Ltd., Singapore, Singapore
fYear
2008
fDate
9-12 Dec. 2008
Firstpage
1005
Lastpage
1010
Abstract
ESD failure limits have been measured in a variety of silicon integrated passive devices using the Human Body Discharge Model. The failure mechanism for these circuits is typically the destructive breakdown of the thin insulator layer in metal-insulator-metal capacitors. The capacitors in this particular technology have a static breakdown of 70 to 100 V. Failure from ESD events for a single capacitor typically occurs for voltages of 200 to 300 V. Tests of more complex circuits show that the ESD performance is extended by using series arrangements of capacitors. In some circuit types it is possible to use inductive shunt protection. This has been found to increase the failure voltage to above 3KV, which was the limit of the test equipment.
Keywords
MIM devices; capacitors; electrostatic discharge; elemental semiconductors; semiconductor device breakdown; silicon; ESD; Si; destructive breakdown; failure mechanism; human body discharge model; metal-insulator-metal capacitors; silicon integrated passive devices; thin insulator layer; voltage 200 V to 300 V; Biological system modeling; Breakdown voltage; Circuit testing; Electric breakdown; Electrostatic discharge; Failure analysis; Humans; Integrated circuit measurements; MIM capacitors; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference, 2008. EPTC 2008. 10th
Conference_Location
Singapore
Print_ISBN
978-1-4244-2117-6
Electronic_ISBN
978-1-4244-2118-3
Type
conf
DOI
10.1109/EPTC.2008.4763561
Filename
4763561
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