DocumentCode :
2520053
Title :
A subthreshold SRAM cell tolerant to random dopant fluctuations
Author :
Mehr, Amir Reza Ahmadi ; Madadi, Iman ; Afzali-Kusha, Ali
Author_Institution :
Nanoelectron. Center of Excellence, Univ. of Tehran, Tehran, Iran
fYear :
2010
fDate :
15-17 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.
Keywords :
MOSFET; SRAM chips; silicon-on-insulator; MOSFET technology; SOI/FINFET structure; SRAM structure; capacitance; low power consumption; random dopant fluctuation; subthreshold SRAM cell; Random access memory; Variable speed drives;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-9997-7
Type :
conf
DOI :
10.1109/EDSSC.2010.5713673
Filename :
5713673
Link To Document :
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