Title :
Growth and characterization of optical grade synthetic quartz
Author :
Suzuki, Carlos K. ; Tanaka, Marcos S. ; Shinohara, Armando H.
Author_Institution :
Dept. of Mater. Eng., Univ. Estadual de Campinas, Sao Paulo, Brazil
Abstract :
A method to position the seed and Z-region of growth out of the circulating micro-particle flux in commercial autoclave has been used to grow optical grade synthetic quartz. The number of solid inclusions is in the range of 0.02-0.03 particles/cm3, depending on the bar. The observation of X-ray topographic contrast of (0003) reflection shows a much smaller Z-region lattice spacing (strain) in comparison with the seed. The dislocation lines are in their totality originated by the seed etch-channels, that means, they can be eliminated by using a better quality seed
Keywords :
X-ray diffraction; X-ray topography; crystal growth from solution; dislocations; inclusions; internal stresses; piezoelectric materials; quartz; (0003) reflection; SiO2; X-ray topographic contrast; Z-region; characterization; circulating micro-particle flux; commercial autoclave; crystal growth; dislocation lines; optical grade synthetic quartz; seed etch-channels; seed position; solid inclusions; strain; Capacitive sensors; Mechanical engineering; Optical distortion; Optical materials; Optical saturation; Optical scattering; Optical surface waves; Solids; Steel; Surface topography;
Conference_Titel :
Frequency Control Symposium, 1996. 50th., Proceedings of the 1996 IEEE International.
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-3309-8
DOI :
10.1109/FREQ.1996.559822
