Advanced free-surface microstereolithography with 10μ resolution for hybrid microstructures

Our group has developed a new free-surface microstereolithography apparatus with high laminate resolution and accuracy. By modifying the design of the squeegee used to laminate the UV curable resin in the apparatus, we reduced the height of the meniscus just behind the squeegee. Through this modification, the laminate resolution of the apparatus was refined to 10 mum .We also applied a liquid surface control system to adjust the surface level of the UV curable resin constantly and precisely. Using the apparatus thus developed, we successfully miniaturized a biochemical IC chip, a functional and three-dimensional microfluidic device. Compared with earlier devices, this advanced apparatus for free-surface microstereolithography can fabricate much smaller microstructures with much smoother surfaces. Henceforth we expect the apparatus and the microstructures fabricated using the apparatus to be increasingly applied in MEMS (MicroElectroMechanical Systems), mu TAS (micro Total Analytical Systems), RP (Rapid Prototyping), and other fields.